EUV lithography systems

ASML

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Extreme Ultraviolet (EUV) lithography simplifies the manufacturing process for the most advanced chips with significant benefits in terms of yield and cycle time. It will help the semiconductor industry to continue Moore's Law well into the next decade by packing more transistors on a chip, reducing cost-per-function and improving energy efficiency. It uses light of a shorter wavelength than the current standard in volume production of the most advanced chips, immersion lithography. EUV can image smaller features without the need for multiple exposures, allowing manufacturers to simplify the manufacturing process, exposing a critical layer of chips in a single step.

Details

Sector - Big Data
- Resource Efficient Industry
Location Veldhoven
Year 2015
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